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Near-ultraviolet and near-infrared electroluminescence from an indium-tin-oxide film native Si oxide/p-Si structure
Y. Q. Wang; T. P. Zhao; J. Liu; G. G. Qin
1999
发表期刊Applied Physics Letters
ISSN0003-6951
卷号74期号:25页码:3815-3817
摘要We have deposited indium-tin-oxide (ITO) films on p-Si (100) substrates with native Si oxide layers on their surfaces using the electron beam depositing technique. After the ITO/native Si oxide/p-Si structure was annealed in a N-2 ambient, electroluminescence spectra with two peaks at near-ultraviolet (similar to 360 nm) and near-infrared (similar to 820 nm) have been measured under a forward bias of 6 V or larger. The experimental results have been interpreted tentatively using the tunneling-luminescence center process. It is considered that the two electroluminescence peaks originate from two groups of luminescence centers in the native Si oxide layers. The luminescence centers responsible for the near-ultraviolet peak have been discussed. (C) 1999 American Institute of Physics. [S0003-6951(99)05125-6].
部门归属peking univ, dept phys, beijing 100871, peoples r china. peking univ, dept elect, beijing 100871, peoples r china. acad sinica, int ctr mat phys, shenyang 110015, peoples r china.;wang, yq (reprint author), peking univ, dept phys, beijing 100871, peoples r china
关键词Oxidized Porous Silicon Light-emission
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WOS记录号WOS:000080857600021
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被引频次:21[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/37526
专题中国科学院金属研究所
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Y. Q. Wang,T. P. Zhao,J. Liu,et al. Near-ultraviolet and near-infrared electroluminescence from an indium-tin-oxide film native Si oxide/p-Si structure[J]. Applied Physics Letters,1999,74(25):3815-3817.
APA Y. Q. Wang,T. P. Zhao,J. Liu,&G. G. Qin.(1999).Near-ultraviolet and near-infrared electroluminescence from an indium-tin-oxide film native Si oxide/p-Si structure.Applied Physics Letters,74(25),3815-3817.
MLA Y. Q. Wang,et al."Near-ultraviolet and near-infrared electroluminescence from an indium-tin-oxide film native Si oxide/p-Si structure".Applied Physics Letters 74.25(1999):3815-3817.
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