Fabrication and electrochromic properties of double layer WO3(V)/V2O5(Ti) thin films prepared by pulsed laser ablation technique

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	Fabrication and electrochromic properties of double layer WO3(V)/V2O5(Ti) thin films prepared by pulsed laser ablation technique
	G. J. Fang; K. L. Yao; Z. L. Liu
	2001
发表期刊	Thin Solid Films
ISSN	0040-6090
卷号	394 期号:1-2 页码:64-71
摘要	Single and double layers of tungsten oxide and vanadium oxide thin films have been deposited on In2O3:SnO2 (ITO) glass using the pulsed laser deposition (PLD) technique at a substrate heating temperature of 200 degreesC and in rich oxygen pressure. The structural properties and chemical composition of as-deposited WO3(V) and V2O5(Ti) thin films were analyzed using X-ray diffraction (XRD), Raman spectrum (RS), and X-ray photo-electron spectroscopy (XPS). The as-deposited V2O5 doped WO3 thin film on ITO glass showed an amorphous structure. Highly oriented growth nano-crystalline TiO2 doped V2O5 thin films with polycrystalline orthorhombic structure were successfully synthesized on ITO glass using the scanning laser ablation technique at a deposition temperature as low as 200 degreesC. Cyclic voltammograms, at a sweep rate of 50 mV s(-1), show that long-term degradation was noticed for the as-deposited WO3(V) thin film, and no Ion-term degradation was noticed for the as-deposited double layer WO3(V)/V2O5(Ti) thin film. Durability was verified to 8000 cycles in the voltage range between -1.0 and 1.0 V. It is demonstrated that these double layer WO3(V)/V2O5(Ti) thin films on ITO are good candidates for cathode thin films for rechargeable batteries and electrochromic devices. As the additional top layer of V2O5M) possesses nano-crystalline and c-axis oriented structure, which is suitable for Li-ions transport, the cycle stability and reversibility of WO3(V) films have been improved. Double layer WO3(V)/V2O5(Ti) thin films provide a neutral brownish blue electrochromic color. Therefore, this double layer film maybe suitable for most building applications. (C) 2001 Elsevier Science B.V. All rights reserved.
部门归属	huazhong univ sci & technol, dept phys, wuhan 430074, peoples r china. huazhong univ sci & technol, natl lab laser technol, wuhan 430074, peoples r china. xiangfan univ, dept phys, xiangtan 441053, peoples r china. chinese acad sci, int ctr mat phys, shenyang 110015, peoples r china.;fang, gj (reprint author), huazhong univ sci & technol, dept phys, wuhan 430074, peoples r china
关键词	V2o5(Ti) Wo3(v) Thin Films Double Layers Pulsed Laser Deposition Technique Electrochromic Properties Chemical-vapor-deposition Vanadium-titanium-oxide Electrical-properties Optical-properties Induced Coloration V2o5 Wo3 Growth No2
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WOS记录号	WOS:000170675600008
引用统计	被引频次：40[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/36637
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	G. J. Fang,K. L. Yao,Z. L. Liu. Fabrication and electrochromic properties of double layer WO3(V)/V2O5(Ti) thin films prepared by pulsed laser ablation technique[J]. Thin Solid Films,2001,394(1-2):64-71.
APA	G. J. Fang,K. L. Yao,&Z. L. Liu.(2001).Fabrication and electrochromic properties of double layer WO3(V)/V2O5(Ti) thin films prepared by pulsed laser ablation technique.Thin Solid Films,394(1-2),64-71.
MLA	G. J. Fang,et al."Fabrication and electrochromic properties of double layer WO3(V)/V2O5(Ti) thin films prepared by pulsed laser ablation technique".Thin Solid Films 394.1-2(2001):64-71.