Helium-charged La-Ni-Al thin films deposited by magnetron sputtering

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	Helium-charged La-Ni-Al thin films deposited by magnetron sputtering
	L. Q. Shi; D. M. Chen; S. L. Xu; C. Z. Liu; W. L. Hao; Z. Y. Zhou
	2005
发表期刊	Fusion Science and Technology
ISSN	1536-1055
卷号	48 期号:1 页码:534-538
摘要	An advanced implantation of low energy helium-4 atoms during the La-Ni-Al film growth by adopting magnetron sputtering with Ar/He mixture gases is discussed Both proton backscattering spectroscopy (PBS) and elastic recoil detection (ERD) analyses were adopted to measure helium concentration of the films and distribution in the near-surface region. Helium atoms with a high concentration incorporate evenly in deposited film. The introduction of the helium with no extra irradiation damage is expected by choosing suitable deposition conditions. It was found that amorphous and crystalline LaNi5 -type structures can be achieved when sputtered with pure Ar and Ar/He mixture gases at room temperature, respectively. Thermal desorption experiments proposes that a part of hydrogen atoms are bound to trapped helium at crystal and releases together with helium. Only a small fraction of helium is released from the helium-vacancy clusters in lower temperature range and most of helium is released from small size helium bubbles in the high temperature range.
部门归属	fudan univ, appl ion beam phys lab, shanghai 200433, peoples r china. chinese acad sci, inst met res, shenyang 110016, peoples r china. china acad engn phys, inst nulear & chem, chengdu 610003, peoples r china.;shi, lq (reprint author), fudan univ, appl ion beam phys lab, shanghai 200433, peoples r china;lqshi@fudan.edu.cn
关键词	Lani4.25al0.75 Behavior Tritides
URL	查看原文
WOS记录号	WOS:000230433300116
引用统计	被引频次：5[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35029
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	L. Q. Shi,D. M. Chen,S. L. Xu,et al. Helium-charged La-Ni-Al thin films deposited by magnetron sputtering[J]. Fusion Science and Technology,2005,48(1):534-538.
APA	L. Q. Shi,D. M. Chen,S. L. Xu,C. Z. Liu,W. L. Hao,&Z. Y. Zhou.(2005).Helium-charged La-Ni-Al thin films deposited by magnetron sputtering.Fusion Science and Technology,48(1),534-538.
MLA	L. Q. Shi,et al."Helium-charged La-Ni-Al thin films deposited by magnetron sputtering".Fusion Science and Technology 48.1(2005):534-538.