Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating

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	Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating
	G. Q. Lin; Y. H. Zhao; C. A. Dong; L. S. Wen
	2007
发表期刊	Plasma Processes and Polymers
ISSN	1612-8850
卷号	4 页码:S120-S123
摘要	Ti/TiN multilayer films were deposited on high-speed-steel (HSS) substrates using pulsed-bias arc ion plating. Orthogonal experiments were used to analyze factors affecting microhardness of the films. The results show that of all the pulsed bias related parameters including pulsed bias magnitude, duty ratio, frequency, and film geometry parameters including modulation period, TiN/Ti thickness ratio, and grain size of TiN, the pulsed bias magnitude is the major factor affecting the microhardness. The maximum microhardness of 34.1 GPa was obtained with pulsed bias magnitude 900 V, duty ratio 50%, frequency 30 kHz, and modulation period 84 nm.
部门归属	[lin, guoqiang; wen, lishi] dalian univ technol, state key lab mat modificat laser ion & electron, dalian 116024, peoples r china. [zhao, yanhui; dong, chuang; wen, lishi] chinese acad sci, inst met res, shenyang 110016, peoples r china.;lin, gq (reprint author), dalian univ technol, state key lab mat modificat laser ion & electron, dalian 116024, peoples r china;dong@dlut.edu.cn
关键词	Arc Ion Plating Films Hardness Microhardness Pulsed Bias Ti/tin Multilayer
URL	查看原文
WOS记录号	WOS:000207735200024
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/33677
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	G. Q. Lin,Y. H. Zhao,C. A. Dong,et al. Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating[J]. Plasma Processes and Polymers,2007,4:S120-S123.
APA	G. Q. Lin,Y. H. Zhao,C. A. Dong,&L. S. Wen.(2007).Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating.Plasma Processes and Polymers,4,S120-S123.
MLA	G. Q. Lin,et al."Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating".Plasma Processes and Polymers 4(2007):S120-S123.