Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering

doi:10.1007/s40195-021-01285-3

IMR OpenIR

	Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering
	Shi, W. B.1,2; Liu, Y. M.3; Li, W. H.1,2; Li, T.1,2; Lei, H.1; Gong, J.1; Sun, C.1
通讯作者	Sun, C.(csun@imr.ac.cn)
	2021-08-09
发表期刊	ACTA METALLURGICA SINICA-ENGLISH LETTERS
ISSN	1006-7191
页码	10
摘要	The influence of the bilayer number on the microstructure, mechanical properties, adhesion strength and tribological behaviors of the WB2/Cr multilayer films was systematically investigated in the present study. Five groups of WB2/Cr films with the same modulation ratio were synthesized by magnetron sputtering technique. The crystalline structure of the films was determined by X-ray diffraction. The morphologies and the microstructure of the films were observed by scanning electron microscopy, atomic force microscopy and transmission electron microscopy. Furthermore, Nano indenter, scratch tester and ball-on-disc tribometer were used to evaluate the mechanical and tribological properties. As bilayer numbers varied from 5 to 40, the hardness increased first and then decreased with the maximum hardness of 33.9 GPa when the bilayer number is 30. The H/E* and H-3/E-*2 values calculated to evaluate the fracture toughness showed the similar changing trend with hardness. The adhesion strength reached the maximum of 67 N when the bilayer number is 30. The surface roughness and friction coefficient decreased with increasing bilayer number. The wear mechanism was also investigated, and the results suggested that the multilayer film with bilayer number of 30 exhibited the best wear resistance (1.78 x 10(-7) mm(3)/Nm), benefiting from the contribution of high hardness, fracture toughness and adhesion strength.
关键词	WB2 Cr multilayer Magnetron sputtering Bilayer number Tribological behavior
资助者	National Natural Science Foundation of China
DOI	10.1007/s40195-021-01285-3
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[51701157]
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000683323900001
出版者	CHINESE ACAD SCIENCES, INST METAL RESEARCH
引用统计	被引频次：7[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/159543
专题	中国科学院金属研究所
通讯作者	Sun, C.
作者单位	1.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Peoples R China
推荐引用方式 GB/T 7714	Shi, W. B.,Liu, Y. M.,Li, W. H.,et al. Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2021:10.
APA	Shi, W. B..,Liu, Y. M..,Li, W. H..,Li, T..,Lei, H..,...&Sun, C..(2021).Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering.ACTA METALLURGICA SINICA-ENGLISH LETTERS,10.
MLA	Shi, W. B.,et al."Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering".ACTA METALLURGICA SINICA-ENGLISH LETTERS (2021):10.