Laser direct writing of Ag films from solution on Si substrate

IMR OpenIR

	Laser direct writing of Ag films from solution on Si substrate
	Sun, K ; Zhang, CB ; Zhao, Y
通讯作者	Zhao, Y(yanzhao@imr.ac.cn)
	2003-11-01
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	19 期号:6 页码:634-636
摘要	Pulsed Nd:YAG laser was used to irradiate Si substrate immersed in AgNO3 ethylene glycol solution to deposit Ag films along the lines scanned by laser on the substrate, which is a photo-thermal decomposing process.. The decomposed Ag atoms congregate and form polycrystalline Ag particles. The Ag concentration changes greatly with the total laser energy absorbed by substrate. Transmission electron microscopy (TEM) observation shows the Ag particles are inlaid in the Si substrate. Auger electron spectrum (AES) shows that the Ag concentration decreases with the increase of the sputtering depth, and there is no oxygen element on the surface of the deposited Ag films.
关键词	pulsed Nd : YAG laser laser direct writing Ag deposited film Si substrate
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000188365400035
出版者	JOURNAL MATER SCI TECHNOL
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/116778
专题	中国科学院金属研究所
通讯作者	Zhao, Y
作者单位	1.Northeastern Univ, Sch Sci, Shenyang 110004, Peoples R China 2.Chinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Sun, K,Zhang, CB,Zhao, Y. Laser direct writing of Ag films from solution on Si substrate[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2003,19(6):634-636.
APA	Sun, K,Zhang, CB,&Zhao, Y.(2003).Laser direct writing of Ag films from solution on Si substrate.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,19(6),634-636.
MLA	Sun, K,et al."Laser direct writing of Ag films from solution on Si substrate".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 19.6(2003):634-636.